Controlling Item Exposure and Test Overlap in Computerized Adaptive Testing

Autor/inn/en	Chen, Shu-Ying; Lei, Pui-Wa
Titel	Controlling Item Exposure and Test Overlap in Computerized Adaptive Testing
Quelle	In: Applied Psychological Measurement, 29 (2005) 3, S.204-217 (14 Seiten) PDF als Volltext Verfügbarkeit
Sprache	englisch
Dokumenttyp	gedruckt; online; Zeitschriftenaufsatz
ISSN	0146-6216
DOI	10.1177/0146621604271495
Schlagwörter	Computer Assisted Testing; Test Items; Computer Simulation; Evaluation Criteria; Statistical Data + Suchen Sie Ihr Suchwort? Test content; Testaufgabe; Computergrafik; Computersimulation
Abstract	This article proposes an item exposure control method, which is the extension of the Sympson and Hetter procedure and can provide item exposure control at both the item and test levels. Item exposure rate and test overlap rate are two indices commonly used to track item exposure in computerized adaptive tests. By considering both indices, item exposure can be monitored at both the item and test levels. To control the item exposure rate and test overlap rate simultaneously, the modified procedure attempted to control not only the maximum value but also the variance of item exposure rates. Results indicated that the item exposure rate and test overlap rate could be controlled simultaneously by implementing the modified procedure. Item exposure control was improved and precision of trait estimation decreased when a prespecified maximum test overlap rate was stringent. (Author).
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Erfasst von	ERIC (Education Resources Information Center), Washington, DC
Update	2017/4/10