Photolithographic fabrication of diffraction and interference slit patterns for the undergraduate laboratory.

Autor/inn/en	Slogoff, H.; Mackowiak, J.; Shishkov, M.; Johnson, A. T.
Titel	Photolithographic fabrication of diffraction and interference slit patterns for the undergraduate laboratory.
Quelle	In: American journal of physics, 72 (2004) 10, S. 1328-1334 PDF als Volltext Link als defekt meldenVerfügbarkeit
Sprache	englisch
Dokumenttyp	online; gedruckt; Zeitschriftenaufsatz
ISSN	0002-9505; 1943-2909
DOI	10.1119/1.1775240
Schlagwörter	Experiment; Lithografie; Doppelspalt; Low-Cost-Experiment; Optik; Physikunterricht; Gitter
Abstract	Measuring the interference and diffraction patterns produced by light passing through single and double narrow slits is a classic undergraduate physics experiment that dramatically confirms the wave nature of light. Despite this critical educational role, the experiment often is problematic because of the failings of commercially available slit patterns which produce faint unconvincing projected patterns. We discuss a low cost photolithographic process that produces diffraction slits in a chromium film deposited on a glass substrate. Slit dimensions as small as 4 mm are attainable with this method with complete control over the spacing of double slits. The method also can be used to expand the variety of slit patterns to two- dimensional arrays and circular patterns. © 2004 American Association of Physics Teachers.
Erfasst von	Arbeitsgruppe Didaktik der Physik, Universität Osnabrück
Update	2005/2